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Nanofabrication of semiconductors employing saccharidic diblock copolymers lithography |
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Principal Investigator : Karim Aissou
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CONTEXT
Today, the
efforts toward developing nanometer scale fabrication methods could be split
into two fields. One field seeks to extend the current planar,
deposit-pattern-etch paradigm used for complementary metal oxide semiconductors
(CMOS). The other seeks new techniques to assemble structures without handling
individual particles: self-assembly.
Diblock copolymers are a promising class of
materials that self-assemble to form ordered nanostructures. These structures
include spheres, cylinders, lamellae, hexagonally ordered cylinders,
biscontinuous cubic gyroids whose shape and dimensions depend on the molecular
weight and composition of the polymer. Diblock copolymer lithography refers to
the use of these nanostructures in thin films as templates.
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