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PROCESS TO ELABORATE AN AMORPHOUS METAL OR NANO CRYSTALYZED FILMS BY MAGNETRON PULVERIZING FROM TARGETS COMPOUNDS OF SEPARATE PURE ELEMENTS |
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Principal Investigator: Pascale Gillon
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TECHNICAL DESCRIPTION
The present invention describes a process and a reactor to perform formation of non-adhesive and hard materials thin film. Thin films are realized by magnetron sputtering apparatus having a substrate placed on a substrate holder in a chamber and targets are focus on substrate. Production is reproducible, fast and permits to control the composition of deposit alloys. The entire process is performed at room temperature.
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