The invention concerns a cleaning process utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises a plurality of alternative suites of:

- A sequence (“negative”) of cleaning of the at least one other polarizable surface by negatively polarization of the surface regarding to the reactor walls (maintained at a reference potential)

- A sequence (“positive”) of cleaning the reactor walls by positively polarization of the surface regarding to the reactor walls maintained at a reference potential